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회전식 화학증착 장치 내부의 유동해석을 통한 최적 유량 평가
논문 개요
| 기관명 | NDSL |
|---|---|
| 저널명 | 한국전산유체공학회지 = Journal of computational fluids engineering |
| ISSN | 1598-6071, |
| ISBN |
논문저자 및 소속기관 정보
| 저자(한글) | |
|---|---|
| 저자(영문) | |
| 소속기관 | |
| 소속기관(영문) | |
| 출판인 | |
| 간행물 번호 | |
| 발행연도 | 2012-01-01 |
| 초록 | A numerical investigation is conducted to search for the optimal flow rate for a rotating-disk chemical vapor decomposition reactor operating at a high temperature and a low pressure. The flow of a gas mixture supplied into the reactor is modeled by a laminar flow of an ideal gas obeying the kinetic theory. The axisymmetric two-dimensional flow in the reactor is simulated by employing a CFD package FLUENT. With operating pressure and temperature fixed, numerical computations are performed by varying rotation rate and flow rate. Examination of the structures of flow and thermal fields leads to a flow regime diagram illustrating that there are a stable plug-like flow regime and a few unfavorable flow regimes induced by mass unbalance or buoyancy. The criterion for sustaining a plug-like flow regime is discussed based on a theoretical scaling argument. Interpretation of the flow regime map suggests that a favorable flow is attainable with a minimum flow rate at the smallest rotation rate guaranteeing the dominance of rotation effects over buoyancy. |
| 원문URL | http://click.ndsl.kr/servlet/OpenAPIDetailView?keyValue=03553784&target=NART&cn=JAKO201212851253713 |
| 첨부파일 |
추가정보
| 과학기술표준분류 | |
|---|---|
| ICT 기술분류 | |
| DDC 분류 | |
| 주제어 (키워드) | 화학증착,회전원판,최적 유량,유동 안정성,플러그 유동,부력구동유동,CVD(Chemical Vapor Deposition),Rotating Disc,Optimal Flow Rate,Flow Stability,Plug Flow,Buoyancy-Induced Flow |