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황화급속열처리를 이용한 SnS 박막성장 및 온도의존성 연구

논문 개요

기관명, 저널명, ISSN, ISBN 으로 구성된 논문 개요 표입니다.
기관명 NDSL
저널명 전기전자재료학회논문지 = Journal of the Korean institute of electronic material engineers
ISSN 1226-7945,
ISBN

논문저자 및 소속기관 정보

저자, 소속기관, 출판인, 간행물 번호, 발행연도, 초록, 원문UR, 첨부파일 순으로 구성된 논문저자 및 소속기관 정보표입니다
저자(한글) 심지현,김제하
저자(영문)
소속기관
소속기관(영문)
출판인
간행물 번호
발행연도 2016-01-01
초록 We fabricated a tin sulfide (SnS) layer with Sn/Mo/glass layers followed by a RTP (rapid thermal processing), and studied the film growth and structural characteristics as a function of annealing temperature and time. The elemental sulfur (S) was cracked thermally and applied to form SnS polycrystalline film out of the Sn percursor at pre-determined pressures in the RTP tube. The sulfurization was done at the temperature from $200^{ circ}C$ to $500^{ circ}C$ for a time period of 10 to 40 min. At ${ leq}300^{ circ}C$ , 20 min., p-type SnS thin films was grown and showed the best composition of at.% of [S]/[Sn] $${ sim_=}$$ 1 and [111] preferred orientation as investigated from using XRD (X-ray diffraction) analysis and EDS (energy dispersive spectroscopy) and SEM (scanning electron microscopy), and optical absorption by a UV-VIS spectrometer. In this paper, we report the details of growth characteristics of single phase SnS thin film as a function of annealing temperature and time associated with the pressure and ambient gas in the RTP tube.
원문URL http://click.ndsl.kr/servlet/OpenAPIDetailView?keyValue=03553784&target=NART&cn=JAKO201607433788517
첨부파일

추가정보

과학기술표준분류, ICT 기술분류,DDC 분류,주제어 (키워드) 순으로 구성된 추가정보표입니다
과학기술표준분류
ICT 기술분류
DDC 분류
주제어 (키워드) Tin sulfide (SnS),Rapid thermal process,Sulfurization,Elemental sulfur(S),Annealing temperature