- HOME
- 홈페이지 이용안내
논문 기본정보
ArF 포토리소그라피공정을 위한 실리콘이 함유된 반사방지막코팅
논문 개요
| 기관명 | NDSL |
|---|---|
| 저널명 | 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19 |
| ISSN | , |
| ISBN |
논문저자 및 소속기관 정보
| 저자(한글) | 이준호,김형기,김명웅,임영택,박주현 |
|---|---|
| 저자(영문) | |
| 소속기관 | |
| 소속기관(영문) | |
| 출판인 | |
| 간행물 번호 | |
| 발행연도 | 2006-01-01 |
| 초록 | Development of ArF Photo-lithography process has proceeded with the increase of numerical aperature (NA) and the decrease of resist thickness. It makes many problems such as cost and process complexity. A novel spin-on hard mask system is proposed to overcome many problems Spin-on hard mask composed of two layers of siloxane and carbon. The optical thickness of two layers is designed from reflectivity measurement at specified n, k respectively. The property of photo-resist shows different results according to Si contents. Si-contents was measured XPS(X-ray Photoelectron spectroscopy). |
| 원문URL | http://click.ndsl.kr/servlet/OpenAPIDetailView?keyValue=03553784&target=NPAP&cn=NPAP08613879 |
| 첨부파일 |
추가정보
| 과학기술표준분류 | |
|---|---|
| ICT 기술분류 | |
| DDC 분류 | |
| 주제어 (키워드) |