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논문 기본정보
Transition temperatures and upper critical fields of NbN thin films fabricated at room temperature
논문 개요
| 기관명 | NDSL |
|---|---|
| 저널명 | Progress in superconductivity and cryogenics : PSAC |
| ISSN | 1229-3008,2287-6251 |
| ISBN |
논문저자 및 소속기관 정보
| 저자(한글) | Hwang, T.J.,Kim, D.H. |
|---|---|
| 저자(영문) | |
| 소속기관 | |
| 소속기관(영문) | |
| 출판인 | |
| 간행물 번호 | |
| 발행연도 | 2015-01-01 |
| 초록 | NbN thin films were deposited on thermally oxidized Si substrate at room temperature by using reactive magnetron sputtering in an $Ar-N_2$ gas mixture. Total sputtering gas pressure was fixed while varying $N_2$ flow rate from 1.4 sccm to 2.9 sccm. X-ray diffraction pattern analysis revealed dominant NbN(200) orientation in the low $N_2$ flow rate but emerging of (111) orientation with diminishing (200) orientation at higher flow rate. The dependences of the superconducting properties on the $N_2$ gas flow rate were investigated. All the NbN thin films showed a small negative temperature coefficient of resistance with resistivity ratio between 300 K and 20 K in the range from 0.98 to 0.89 as the $N_2$ flow rate is increased. Transition temperature showed non-monotonic dependence on $N_2$ flow rate reaching as high as 11.12 K determined by the mid-point temperature of the transition with transition width of 0.3 K. On the other hand, the upper critical field showed roughly linear increase with $N_2$ flow rate up to 2.7 sccm. The highest upper critical field extrapolated to 0 K was 17.4 T with corresponding coherence length of 4.3 nm. Our results are discussed with the granular nature of NbN thin films. |
| 원문URL | http://click.ndsl.kr/servlet/OpenAPIDetailView?keyValue=03553784&target=NART&cn=JAKO201530261998882 |
| 첨부파일 |
추가정보
| 과학기술표준분류 | |
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| ICT 기술분류 | |
| DDC 분류 | |
| 주제어 (키워드) | Niobium nitride thin film,reactive magnetron sputtering,granular superconductivity,nitrogen flow rate |