- HOME
- 홈페이지 이용안내
논문 기본정보
Neodymium이 첨가된 lt;TEX gt;$Bi_4Ti_3O_{12}$ lt;/TEX gt; 강유전체 박막의 유전 특성
논문 개요
| 기관명 | NDSL |
|---|---|
| 저널명 | 대한전기학회 2005년도 제36회 하계학술대회 논문집 C |
| ISSN | , |
| ISBN |
논문저자 및 소속기관 정보
| 저자(한글) | 권현율,남성필,이상헌,배선기,이영희 |
|---|---|
| 저자(영문) | |
| 소속기관 | |
| 소속기관(영문) | |
| 출판인 | |
| 간행물 번호 | |
| 발행연도 | 2005-01-01 |
| 초록 | Ferroelectric $Bi_{3.25}Nd_{0.75}Ti_3O_{12}$ (BNdT) thin films were proposed for capacitor of FeRAM. The BNdT thin films were grown on Pt/Ti $SiO_2/P-Si(100)$ substrates by the RF magnetron sputtering deposition. The dielectric properties of the BNdT were investigated by varying post-annealing temperatures. Increasing post-annealing temperature, the (117) peak was increased. An increase of rod type grains of BNdT films with increasing post-annealing temperature was observed by the Field Emission Scanning Electron Microscopy(FE-SEM). The dielectric constant and dielectric loss of the BNdT thin films with post-annealing temperature of $700^{ circ}C$ were 418 and 0.37, respectively. |
| 원문URL | http://click.ndsl.kr/servlet/OpenAPIDetailView?keyValue=03553784&target=NPAP&cn=NPAP08088649 |
| 첨부파일 |
추가정보
| 과학기술표준분류 | |
|---|---|
| ICT 기술분류 | |
| DDC 분류 | |
| 주제어 (키워드) |