듀얼 챔버 고진공 열증착기
기관명 | ZEUS |
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장비번호 | |
제작사 | 지브이텍 |
모델명 | 모델명 없음 |
장비사양 | |
취득일자 | 2014-06-12 |
취득금액 |
보유기관명 | (재)나노기반소프트일렉트로닉스연구단 |
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보유기관코드 | |
활용범위 | |
활용상태 | |
표준코드 | C503 |
표준분류명 | |
시설장비 설명 | Evaporation system for organic and metal thin film deposition. Optimum design for 6’’ sample mounted 4-metal source with power supply. Metal process Chamber. 4-Organic & 2 Metal source with power supply. Organic process chamber. Cryopump installed for rapid high vacuum pumping down and Thickness monitor installed for deposition rate controlling with glove box installed.1 Metal Organic process chamber unit -1set 2 High vacuum pumping unit -2set 3 Substrate holder and thickness monitor unit -2set 4 Deposition source & control unit -10set 5 System control & frame unit -1set 6 Optimum size for 6" sample 7 4-metal source installed 8 4-organic 2-metal source installed 9 Welded rectangular chamber 10 5 x 10E-6 Torr base pressure after fully cyclic dry-N2 purge 11 Substrate Rotation availableDeposition of various organic and metal materials by evaporation process. Process chamber can be freely selected to match the application. This can be used for fabrication of molecular devices and biosensors organic EL/semiconductors layer insulator film organic functional thin films and such thing with enables a continuous series of vacuum processes. Organic material applications enable selection of evaporation sources according to vapor pressure. Can be upgraded in future by connecting additional process chambers as desired. |
장비이미지코드 | http://nfec.ntis.go.kr/storage/images/equip/photo/201407/.thumb/2014070214748729.jpg |
장비위치주소 | 경북 포항시 남구 지곡동 756 (재)나노기반소프트일렉트로닉스연구단 포항공과대학교내 RIST 제3연구동 3층 3340 |
NFEC 등록번호 | NFEC-2014-07-189797 |
예약방법 | |
카타로그 URL | |
메뉴얼 URL | |
원문 URL | http://www.zeus.go.kr/equip/read?equipId=Z-NTIS-0043708 |
첨부파일 |
과학기술표준분류 | |
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ICT 기술분류 | |
주제어 (키워드) |