| 시설장비 설명 |
1. Ion gun 1) Type : Penning type or Saddle field type Ar gun 2) Discharge voltage : 0 to 1.5kV or wider 3) Discharge current : 0 to 560㎂ or wider 4) Accelerating voltage : 0 to 6㎸ or wider 5) Ion beam diameter : Max. 500㎛ or better 6) Milling rate : Cross-section - 300㎛/hr (Sample Si, 6kV) or better 7) Ar gas flow control : High accuracy Mass flow control 2. Stage 1) X movement : ±7㎜ or wider 2) Y movement : 0 to +3㎜ or wider 3) Sample rotation : ±3˚ or wider 4) Swing angle : ±15˚, ±30˚, ±40˚ (selectable) 5) Sample swing spped : OFF + 1 speed or more 6) Max. sample size : 20㎜W x 12㎜D x 7㎜H or larger 3. Stage for flat milling 1) X movement : 0 to 5㎜ or wider 2) Tilt : 0 to 90˚or wider 3) Sample rotation : ±5˚ or wider 4) Swing angle : ±60˚, ±90˚ (selectable) 5) Sample rotation spped : 1r/m, 25r/m (selectable) 6) Sample swing spped : 1r/m, 10r/m (selectable) 7) Max. sample size : 50㎜Φ x 25㎜H or larger 4. Vacuum system 1) Main pump : TMP - 26L/sec x 1 or better 2) Oil rotary pump : 20L/min x 1 or better 3) Ar gas flow control type : Mass flow controller 5. Safety device - In case of power failure or accident, the protective circuit should be actuated and protects the unit from trouble. |
