| 시설장비 설명 |
1. Process chamber: - The cathode and anode are both machined out of single blocks of aluminum - 6 inch wafer suscepter - changable to 2 4 inch - 2KW 2MHz ICP source with 600W 13.56MHz bias power - 150mm electrode with helium back-side cooling and mechanical clamping with ceramic clamp - ISO-200 vacuum port manifold to pump down the process chamber with high pumping conductance 2. Vacuum Loadlock: - Including end-effector for transferring a wafer between loadlock and process chamber without breaking vacuum. - VAT Reactor isolation valve with loadlock chamber. - Linear movement vacuum robot has a direct drive pick and place mechanism that provides high reliability for wafer handling |
