증착 시스템
기관명 | ZEUS |
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장비번호 | |
제작사 | 에스엔텍 |
모델명 | REP-5004 series |
장비사양 | |
취득일자 | 2010-10-11 |
취득금액 |
보유기관명 | 광주과학기술원 |
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보유기관코드 | |
활용범위 | |
활용상태 | |
표준코드 | C504 |
표준분류명 | |
시설장비 설명 | 특징 퍼터링 타겟에 Au 또는 니켈 등의 금속 물질을 증착시킬 때 사용되는 필수 장비 특징 1. Evaporating System : 1 Sys. 1.1 Main Processing Chamber ▶ Material : Stainless Steel & Aluminum ▶ Internal Shape : Circular ▶ Internal Dimension : About 450㎜ Dia. 520㎜(H) ▶ Chamber Wall Cooling ▶ Front Door Type Shape ▶ Inner shield cover ▶ Various functional port (ex : gauge vent pumping view port etc) - View Port - Gauge Port Vent Port 1.2 Vacuum Pumping Unit ▶ High Vacuum Pump : 1Ea - Turbo Molecular Pump with Power Supply - Brand : OSAKA in Japan - Magnetic Suspension Type - Pumping Speed : 1100 L/Sec ▶ Oil Free Dry Pump : 1Ea - Pumping Speed : 27M3/Hour - Brand : Alcatel in France 1.3 E-Beam Source with Power Supply : 1 Set 1.3.1 Electron Beam Source ▶ Electron Gun - 4 Pocket of 7cc Crucible - Source 270。Deflection - Central Feed through for Crucible Drive and Water Cooling ▶ Electron Gun Power Supply with X-Y Sweep - Input Power : 220VAC /3Ø 60 Hz 40A - Maximum Power : 6 KW - Electro-Pneumatic Drive for Shutter - High Voltage Power Electrical Feed through - Crucible Indexers with Motor Assembly 1.4 Substrate Rotation & Z-Motion ▶ Stage Dimension : 4 inch Size ▶ Sample Rotation using Ferro Sealed rotary motion - RPM : 5~20 ▶ Sample Susceptor : SUS or ETC ▶ Z-motion Unit - Super Bellow /Stroke : ±50 mm - LM Guide & Ball Screw / DC 90V Motor with Controller - Position Sensor for Sample Loading/Unloading & T/S Distance Adjust 1.5 Vacuum Gauge & Thickness Monitor 1.5.1VacuumGauge ▶ Touch Panel (PLC) display the chamber & pumping line in real time ▶ Pirani & Cold cathode gauge -Pressure range : 760 Torr ~ 10-9Torr ▶ ATM Sensor 1.5.2 Multi Film Rate & Thickness Controller : 1 Set ▶ Thickness Display Auto Ranging : 0.00 to 999.9 KÅ ▶ Rate Display Auto Ranging : 0.0 to 999 Å/sec ▶ Automatically Adjustable Interface of Thickness Rate ▶ Crystal Sensor Packaging - Sensor Head & Oscillator 구성및성능 메인 프로세싱 챔버 배큠 로드록 시스템 소프트웨어 앤 유틸리티 ▶ Water & Air Distribution unit - Water (PCW) & Air (CDA) Flow indicator ▶ 19" Control rack inside / Mobile with transport rollers활용분야 Graphene device용 metal 전극 증착 Graphene 형성을 위한 metal template 증착 ▶ Housing all the electronic sub system control units pneumatics water gas services and turbo Molecular pumps. Etc ▶ Fully interlock system for protecting hardware from any service failure and the operator from electrical shock during maintenance |
장비이미지코드 | http://nfec.ntis.go.kr/storage/images/equip/photo/201310/.thumb/2013100811636677.jpg |
장비위치주소 | 광주 북구 오룡동 광주과학기술원 1 광주과학기술원 신소재공학동 2층 207 |
NFEC 등록번호 | NFEC-2010-10-085711 |
예약방법 | |
카타로그 URL | |
메뉴얼 URL | |
원문 URL | http://www.zeus.go.kr/equip/read?equipId=Z-NTIS-0018385 |
첨부파일 |
과학기술표준분류 | |
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ICT 기술분류 | |
주제어 (키워드) |