| 시설장비 설명 |
탄소소재 및 기초화합물/합성물의 정량 분석 및 자외선/가시광선/근적외선 영역대의 파장별 투과도 반사도 및 총투과/총반사량 측정 Optics configuration Oouble beam Monochromator Oouble out of plane Littrow Monochromator Beam Splitting : Chopper 30 Hz Grating: 70 x 45 mm UV-Vis : 1200 lines/mm blazed at 250 nm NIR : 300 lines/mm blazed at 1192 nm Oetector : UV -Vis : R928 PMT / NIR : Cooled PbS Photocell Wavelength range 175-3300nm Spectral bandwidth UV-Vis 0.01-5.00nm O.Olnm steps motor driven NIR : 0.04-20nm Limiting Resolution UV-Vis <0.048 nm / NIR : <0.2 Wavelength accuracy +- 0.08 nm at 190-900 nm +- 0.4 nm at 760-3000 nm Wavelength reproducibility : UV-Vis <0.005nm / NIR <0.02nm Stray light : <0.00007%T at 220nm 10 g/L NaI ASTM method <0.00007%T at 370nm 50 mg/L NaNOz <0.0002%T at 1420nm HzO 1cm pathlength <0.00045%T at 2365nm CHCh 1cm pathlength Photometric range 8.0 Abs Photometric accuracy: <0.00025 Abs at 0.3 Abs (Oouble Aperture method) Photometric reproducibility Using NIST 9300 filters at 546.1nm ls SAT 2nm SBW <0.00008 Abs at 0.5Abs <0.00014 Abs at 1.0Abs Photometric stability : <0.0002 Abs/hour at 500 nm ls SAT 2nm SBW Photometric Linearity: All tests performed by addition of filters technique UV-Vis (465nm lOs SAT 2nm SBW) NIR (1 200nm 10s SAT energy 3) UV-Vis at 1Abs. <0.0007 UV-Vis at 2Abs. <0.0014 UV-Vis at 3Abs. <0.005 NIR. at 1Abs. <0.0015 NIR. at 2Abs. <0.007 Scan speed range : 1-3000nm/min Baseline flatness : :l:: 0.0007Abs. at 200 to 3000nm no smoothing applied |
